What is ITO target and its cold isostatic pressing

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What is ITO target and its cold isostatic pressing

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The ITO target material is a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proportion, processed by a series of production processes, and then sintered in a high temperature atmosphere (1600 degrees, sintered with oxygen).

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What is ITO target and its cold isostatic pressing


What is ITO target? 

The ITO target material is a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain proportion, processed by a series of production processes, and then sintered in a high temperature atmosphere (1600 degrees, sintered with oxygen).


·Cold isostatic pressing method

The cold isostatic pressing method is to put the pre-formed china into a rubber jacket and immerse it in a high-pressure liquid so that it is subjected to isotropic pressure to realize the enhancement of the density of the china. Cold isostatic pressing is only to obtain a green body with the highest possible density, which makes the sintering and densification of the green body easier. Since cold isostatic pressing does not have the sintering ability of hot isostatic pressing, an independent sintering process is required to sinter the green body.


Cold isostatic pressing can suppress large-sized targets, and is currently the preferred molding method for most companies. Forming studies at home and abroad have shown that cold isostatic pressing can produce high-quality green bodies that meet the needs of ceramic targets. However, when cold isostatic pressing is used to form super-sized green bodies, the equipment investment is very expensive due to the limitation of the chamber size, and there is a deformation problem when the green bodies are thin and large in size. At the same time, when pressing green bodies of different sizes, it is necessary to prepare pre-pressing molds of different specifications, and the cost of the molds is relatively high.

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